Terepenic series-pyrogallol resins and their application to chemical amplification resists.
نویسندگان
چکیده
منابع مشابه
Chemical Amplification Resists for Future Lithography
The technologies for future lithography have been proposed, such as i-line phase-shifting lithography, deep-UV lithography and electron beam lithography. We have proposed several types of chemical amplification resist systems for future lithography. These are based on the change in dissolution rate by acid catalyzed reaction for aqueous development: dissolution inhibitor to dissolution promoter...
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Synthesis of New Ladder Cyclic Materials (Noria Derivatives) with Photo-Reactive Groups and Their Application to EUV-Resists, EB-Resists and Photo-Curable Materials
ABSTRACT Noria derivatives containing protective groups such as t-BOC group, t-butyl ester group (t-BAc), adamantyl group (Ad) were synthesized and evaluated as alkaline developable positive-type EBand EUV-resists. As the result, it was cleared that Noria-t-BOC and Noria-t-BAc showed 50 nm and 70 nm resolutions as EB-resists, respectively. Noria-Ad also showed clear line and space pattern with ...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 1990
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.3.319